Abstract:
PreVi011.3 ':i or~ : indicat e('. tk~t ho t~)rE's sed ~-Al B 12
1i~2, ~' a semiconductor. r:Toreove r , the s i mpl.(~ electronic
t heory also indi cates that ~ -AIB1 2 should be a semico
nductor, since thf're is one nonbonding e 'Le ctrofl
per AlB12- uni t. JPor these reasons, we decided to
measure t he electrical n ropert i ~ s of ~ -AlB1 2 single
crystal s .
Singl e crystal s of¥- AIB 12 ab ou t 1 x 1 r1n1 . size
were grown from a copper mel t at 12500 C. The melt
technique coupled. 1,vi th slow cooling vilas used because
of i ts advantages such as : siTYInle set- up of the
expe rimon t ; only e ;l.sil y available c hemi cals are
required and it i s a c omparatively strair::bt forvvard
y,le t hod still yielding crystal s big enouGh for OtU'
purpose . Copper rms used as a solvent , i nst8ad of
previOl.wly used aluminum , because it allows c.l.'ystal
growth at hig he r t emneratures.
HovlGver, the cry s tals of ] -AlB12 shm'red very
hi gh res i s t ance a t r oom temperature . From our
neasureJ'lents we conclude that the r esistivity of
j3- Al B12 is, at least, given as ~ = 4. x 107 oblD .em ••
Those results are inc ons i s t ent wi 'uh the ones .. reported
by IIiss Khin fo r bot- pressed j3-AlB12 g i ven a s = 7600
ohm . em . or I e s s . ' Since tbe hot pressing was done
at about 800 - ' 9000C i n ~ rap hi te moul ds 1,7i th 97%
AlB12- p oVJder, vie thi nk there is pas s ib i 1 i ty th a.t
lower borides or borot] carbide are , being formed,
':.Jhich are k11 own to be good semiconductors .
v7e tried to ro-pe r-AlB12 by addi'J,'?: agents s uch
as l:Ig , IG.-InO 4. ' HgS04 , KI12PO 4·' etc. to t he melt ..
However , all these re age 11 t eel either reduced the yield
and size of t lJe crystals or r;ave crystals of high
r esis'can ce again. We think tba t molten copper keeps
t he i mpurities off . There is also a pos s i bil i ty
t hc:!,t these doping agents get oxidi~::;ed at '1 250°C •
Hence, we co ~ clud e that J -AIB12 has v~ ry high
r es i stance at r oom temperature . This was a l s o C011 -
fi rmed by checki ng the siYlgle and. polycrystals of
.~-AIB12 from Norton Co., Ontario and Cooper
Nletallurgical Association.
Boron carbide has been reported to be a semiconductor
with ~ - 0.3 to 0.8 ohm . cm. for hotpres
sed s araples. Boron carbide b e inq: struct urally
related to ¥-AIB12 , we de cided to study the electrical
prone rties of it~ Single crystals. These crystals
were cut from a Single melt grovvn crystal a t Norton
Co., Ontario. The resistivity of th," se crystal s was
measured by the Van der Pam-v' s ~ nethod, which \vas
very c onvenient fo r our crystal sha-pp.s.
Some of the crystals showed resistivity
~ == 0.50 ob,Tn.cr] . i n agreement with the previously
reported results . However , a few crystals showed
lower resistivity e.g . 0 .13 and 0.20 ohm.cra • • The
Hall mobility could .not be measured and th8reiore
i s lower than 0 .16 em 2 v - 1 sec -1 • This is in agreement
\vith t he re1)orted Hall mobility for pyrolytic boron
. _ 2 -1 -1
carbide as 0.13 cm v sec •
We also studied the orientation of the boron
carbide crystals by the Jjaue-method. The inclination
of c-axis with res pect to x-ray be81Il was det ermined .
This was found to be 100 t o 20° f or normal resistivity
sarnples (0.5 ohm . cm.) and 27 - 30° for t he lower
r esistivity samples (0.1 ~5 to 0.20 ohm.cm .).
This indica tes the possibility that th.e r es if.1tivity
of B13C3 i s orientation dependent.